JPH0258773B2 - - Google Patents
Info
- Publication number
- JPH0258773B2 JPH0258773B2 JP57062175A JP6217582A JPH0258773B2 JP H0258773 B2 JPH0258773 B2 JP H0258773B2 JP 57062175 A JP57062175 A JP 57062175A JP 6217582 A JP6217582 A JP 6217582A JP H0258773 B2 JPH0258773 B2 JP H0258773B2
- Authority
- JP
- Japan
- Prior art keywords
- mobility
- channel
- carrier
- field effect
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/801—FETs having heterojunction gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/204—Velocity modulation transistors [VMT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
- H10D30/4732—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT using Group III-V semiconductor material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/602—Heterojunction gate electrodes for FETs
Landscapes
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57062175A JPS58178572A (ja) | 1982-04-14 | 1982-04-14 | 移動度変調形電界効果トランジスタ |
CA000425702A CA1217575A (en) | 1982-04-14 | 1983-04-12 | Mobility-modulation field-effect transistor |
EP83302074A EP0091831B1 (en) | 1982-04-14 | 1983-04-13 | Mobility-modulation field effect transistor |
DE8383302074T DE3381069D1 (de) | 1982-04-14 | 1983-04-13 | Feldeffekttransistor mit modulierter beweglichkeit. |
US06/484,600 US4688061A (en) | 1982-04-14 | 1983-04-13 | Mobility-modulation field-effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57062175A JPS58178572A (ja) | 1982-04-14 | 1982-04-14 | 移動度変調形電界効果トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58178572A JPS58178572A (ja) | 1983-10-19 |
JPH0258773B2 true JPH0258773B2 (en]) | 1990-12-10 |
Family
ID=13192518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57062175A Granted JPS58178572A (ja) | 1982-04-14 | 1982-04-14 | 移動度変調形電界効果トランジスタ |
Country Status (5)
Country | Link |
---|---|
US (1) | US4688061A (en]) |
EP (1) | EP0091831B1 (en]) |
JP (1) | JPS58178572A (en]) |
CA (1) | CA1217575A (en]) |
DE (1) | DE3381069D1 (en]) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0810751B2 (ja) * | 1983-12-23 | 1996-01-31 | 株式会社日立製作所 | 半導体装置 |
JPH06105717B2 (ja) * | 1984-01-14 | 1994-12-21 | 富士通株式会社 | 電界効果型半導体装置 |
US4791072A (en) * | 1984-06-15 | 1988-12-13 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method for making a complementary device containing MODFET |
JPH0714055B2 (ja) * | 1984-09-03 | 1995-02-15 | 日本電気株式会社 | 電界効果型素子 |
US4745452A (en) * | 1984-09-24 | 1988-05-17 | Massachusetts Institute Of Technology | Tunneling transfer devices |
JPS61174776A (ja) * | 1985-01-30 | 1986-08-06 | Sony Corp | ヘテロ接合電界効果トランジスタ |
JPS62256478A (ja) * | 1986-04-30 | 1987-11-09 | Sumitomo Electric Ind Ltd | 化合物半導体装置 |
FR2600821B1 (fr) * | 1986-06-30 | 1988-12-30 | Thomson Csf | Dispositif semi-conducteur a heterojonction et double canal, son application a un transistor a effet de champ, et son application a un dispositif de transductance negative |
US4821093A (en) * | 1986-08-18 | 1989-04-11 | The United States Of America As Represented By The Secretary Of The Army | Dual channel high electron mobility field effect transistor |
WO1988002557A1 (en) * | 1986-09-25 | 1988-04-07 | Regents Of The University Of Minnesota | Modulation doped radiation emitting semiconductor device |
US4905059A (en) * | 1986-09-25 | 1990-02-27 | Regents Of The University Of Minnesota | Modulation doped radiation emitting semiconductor device |
JPS63102374A (ja) * | 1986-09-29 | 1988-05-07 | シーメンス、アクチエンゲゼルシヤフト | 電界効果トランジスタ |
US4882608A (en) * | 1987-02-09 | 1989-11-21 | International Business Machines Corporation | Multilayer semiconductor device having multiple paths of current flow |
US4855797A (en) * | 1987-07-06 | 1989-08-08 | Siemens Corporate Research And Support, Inc. | Modulation doped high electron mobility transistor with n-i-p-i structure |
US4839702A (en) * | 1987-11-20 | 1989-06-13 | Bell Communications Research, Inc. | Semiconductor device based on charge emission from a quantum well |
US4839310A (en) * | 1988-01-27 | 1989-06-13 | Massachusetts Institute Of Technology | High mobility transistor with opposed-gates |
DE3811801A1 (de) * | 1988-04-08 | 1989-10-19 | Siemens Ag | Halbleiter-bauelement, geeignet als extrem schneller schalter |
US5633512A (en) * | 1990-05-23 | 1997-05-27 | Canon Kabushiki Kaisha | Semiconductor device for varying the mobility of electrons by light irradiation |
JP2919581B2 (ja) * | 1990-08-31 | 1999-07-12 | 三洋電機株式会社 | 速度変調トランジスタ |
US5350936A (en) * | 1993-07-19 | 1994-09-27 | Texas Instruments Incorporated | Linear field effect transistor |
CN102437025B (zh) * | 2011-12-02 | 2013-04-24 | 南京大学 | 一种消除pmos中负偏压温度不稳定性影响的方法 |
CN110741478B (zh) * | 2017-10-18 | 2023-08-29 | 汉阳大学校产学协力团 | 层、多级元件、多级元件制造方法和驱动多级元件的方法 |
US10978561B2 (en) | 2017-10-18 | 2021-04-13 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element |
US12261216B2 (en) | 2021-06-24 | 2025-03-25 | Marvell Asia Pte Ltd | Network device having transistors employing charge-carrier mobility modulation to drive operation beyond transition frequency |
WO2022269366A1 (en) | 2021-06-24 | 2022-12-29 | Marvell Asia Pte Ltd | A network device having transistors employing charge-carrier mobility modulation to drive operation beyond transition frequency |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1418613A (fr) * | 1963-12-30 | 1965-11-19 | Ibm | Dispositif semi-conducteur à jonctions hétérogènes utilisant le transfert de porteurs majoritaires |
US4236167A (en) * | 1978-02-06 | 1980-11-25 | Rca Corporation | Stepped oxide, high voltage MOS transistor with near intrinsic channel regions of different doping levels |
US4242691A (en) * | 1978-09-18 | 1980-12-30 | Mitsubishi Denki Kabushiki Kaisha | MOS Semiconductor device |
FR2465317A2 (fr) * | 1979-03-28 | 1981-03-20 | Thomson Csf | Transistor a effet de champ a frequence de coupure elevee |
US4257055A (en) * | 1979-07-26 | 1981-03-17 | University Of Illinois Foundation | Negative resistance heterojunction devices |
FR2465318A1 (fr) * | 1979-09-10 | 1981-03-20 | Thomson Csf | Transistor a effet de champ a frequence de coupure elevee |
IT1149814B (it) * | 1979-11-26 | 1986-12-10 | Ibm | Struttura semiconduttrice |
EP0033037B1 (en) * | 1979-12-28 | 1990-03-21 | Fujitsu Limited | Heterojunction semiconductor devices |
FR2489045A1 (fr) * | 1980-08-20 | 1982-02-26 | Thomson Csf | Transistor a effet de champ gaas a memoire non volatile |
-
1982
- 1982-04-14 JP JP57062175A patent/JPS58178572A/ja active Granted
-
1983
- 1983-04-12 CA CA000425702A patent/CA1217575A/en not_active Expired
- 1983-04-13 DE DE8383302074T patent/DE3381069D1/de not_active Expired - Lifetime
- 1983-04-13 US US06/484,600 patent/US4688061A/en not_active Expired - Lifetime
- 1983-04-13 EP EP83302074A patent/EP0091831B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS58178572A (ja) | 1983-10-19 |
CA1217575A (en) | 1987-02-03 |
US4688061A (en) | 1987-08-18 |
EP0091831A2 (en) | 1983-10-19 |
EP0091831B1 (en) | 1990-01-03 |
DE3381069D1 (de) | 1990-02-08 |
EP0091831A3 (en) | 1986-02-12 |
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